Diamond
deposition on modified silicon substrates: Making diamond atomic force
microscopy tips for nanofriction experiments
Tanasa G, Kurnosikov O, Flipse CFJ, Buijnsters JG, van Enckevort WJP
JOURNAL OF APPLIED PHYSICS 94 (3): 1699-1704 AUG 1 2003
Abstract: Fine-crystalline
diamond particles are grown on standard Si atomic force microscopy
tips, using hot filament-assisted chemical vapor deposition. To
optimize the conditions for diamond deposition, first a series of
experiments is carried out using silicon substrates covered by
point-topped pyramids as obtained by wet chemical etching. The apexes
and the edges of the silicon pyramids provide favorable sites for
diamond nucleation and growth. The investigation of the deposited
polycrystallites is done by means of optical microscopy, scanning
electron microscopy and micro-Raman spectroscopy. The resulting
diamond-terminated tips are tested in ultra high vacuum using
contact-mode atomic force microscope on a stepped surface of sapphire
showing high stability, sharpness, and hardness.