Abstract:
The atomic structure of the {111} diamond face after oxygen-water-vapor
etching is determined using x-ray scattering. We find that a single dangling
bond diamond {111} surface model, terminated by a full monolayer of -OH
fits our data best. To explain the measurements it is necessary to add
an ordered water layer on top of the -OH terminated surface. The vertical
contraction of the surface cell and the distance between the oxygen atoms
are generally in agreement with model calculations and results on similar
systems. The OH termination is likely to be present during etching as well.
This model experimentally confirms the atomic-scale mechanism we proposed
previously for this etching system.